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THIN FILM PROCESSING

  • Thermal Oxide
  • Low Temp Oxide (LTO)
  • Low-K Oxide (K<3)
  • PETEOS Oxide
  • POCL3 (Phos) Doping & N+ Drive Poly
  • Plasma Oxide
  • Silicon Carbide
  • Polysilicon
  • PECVD Amorphous Silicon
  • LPCVD Silicon Nitride
  • Plasma Nitride
  • Oxy-Nitride
  • SiON
  • BPSG
  • Photoresist Coating (I-Line/DUV)
  • Electroplated Copper (ECP)

PVD Metals

  • PVD Al
  • PVD Al Alloys
  • PVD Cu
  • PVD Ti
  • PVD TiN
  • PVD Ta
  • PVD TaN
  • PVD W
  • PVD WTi (90/10)
  • PVD Cr
  • PVD NiV
  • PVD NiFe
  • PVD ITO (90/10)
  • PVD Co
  • PVD CoFe
  • PVD C
  • PVD Si
  • PVD Zr
  • PVD Nb
  • PVD Mg
  • PVD SiO2
  • PVD Al2O3
  • PVD AlN
  • PVD Mo
  • PVD Au
  • PVD Pt
  • PVD Pd
  • PVD Ag

CUSTOM PROCESSING

  • Oxide Stripping
  • Photoresist Stripping
  • Metal Stripping
  • Wafer Cleaning
  • Wafer Polishing
  • Epitaxial Services
  • Dicing
  • Lapping
  • Laser Marking
  • Wafer Reclaiming
  • Wafer Thinning
  • Wafer Grinding
  • Patterning

Testing

  • Step Heights
  • Surface Roughness
  • Film Stress
  • Resistance Mapping
  • Uniformity Mapping
  • Particle Scanning
  • Bow/Warp Measurments


 
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Si Wave Co., Ltd. (Taiwan HQ)   Si Wave Co., Ltd. (US)
#1, Alley 45, Lane 727, Chung Hwa Rd.,Yung Kang District, Tainan, Taiwan
  E-mail: siwave@seed.net.tw
Tel: +886-6-302-5286 • E-mail: siwave@seed.net.tw